SpecEL-2000

Spectrocopic Ellipsometry

The SpecEl-2000 spectroscopic ellipsometer works in the UV/VIS/NIR spectral range and is one of the most compact, easy-to-use and cost-efficient systems for analyzing the film thickness and optical properties (n and k) of single film and multiple layer stacks .

Key Features: Film thickness from 0.1 nm up to 10 μm, 0.1nm resolution, 7- 10s
measurement speed, accessories for sample mapping and automation.

Application Areas: Semiconductor films, optical layers, anti-wear coatings.

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PlasCalc-2000

Plasma Monitoring

The PlasCalc-2000 is a plasma monitoring and process control system based on optical
UV/VIS/NIR emissions-spectroscopy. The system can be programmed for individual
process requirements.

Key Features: 200-1100nm spectral range, 1nm optical resolution, automatic peak
finding and line identification.

Application Areas: Film deposition, plasma etching, plasma chamber health control.

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NanoCalc-XR

Thin Film Metrology: Spectroscopic Reflectometry

The NanoCalc is a versatile and inexpensive thin film measurement system utilising spectroscopic reflectometry to accurately determine optical and non-optical thin film thicknesses from 1nm-250microns thickness in stacks up to 10 layers.

Key Features: Accuracy to 1nm, resolution to 0.1nm, adaptors for complex geometries
and accessories for thickness mapping.

Application Areas: MEMS, industrial, medical and semiconductor coatings

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