The SpecEl-2000 spectroscopic ellipsometer works in the UV/VIS/NIR spectral range and is one of the most compact, easy-to-use and cost-efficient systems for analyzing the film thickness and optical properties (n and k) of single film and multiple layer stacks .
Film thickness from 0.1 nm up to 10 μm, 0.1nm resolution, 7- 10s
measurement speed, accessories for sample mapping and automation.
Semiconductor films, optical layers, anti-wear coatings.download datasheet
The PlasCalc-2000 is a plasma monitoring and process control system based on optical
UV/VIS/NIR emissions-spectroscopy. The system can be programmed for individual
200-1100nm spectral range, 1nm optical resolution, automatic peak
finding and line identification.
Film deposition, plasma etching, plasma chamber health control.download datasheet
Thin Film Metrology: Spectroscopic Reflectometry
The NanoCalc is a versatile and inexpensive thin film measurement system utilising spectroscopic reflectometry to accurately determine optical and non-optical thin film thicknesses from 1nm-250microns thickness in stacks up to 10 layers.
Accuracy to 1nm, resolution to 0.1nm, adaptors for complex geometries
and accessories for thickness mapping.
MEMS, industrial, medical and semiconductor coatingsdownload datasheet